Assembly Comprising a Cryostat and Layer of Superconducting Coils and Motor System Provided With Such an Assembly

ABSTRACT

The invention provides an assembly comprising a cryostat and a flat coil layer of superconducting coils for use with a magnetic levitation and/or acceleration motor system of a lithographic apparatus. The cryostat comprises two insulation coverings. The coil layer is arranged between the two coverings. The coverings each comprise an inner plate configured to be cryocooled and an outer plate parallel to the inner plate, and an insulation system with a vacuum layer between the inner and outer plate. The insulation system of said covering comprises a layers of circular bodies, the central axes of these bodies extending perpendicular to the inner and outer plate, and is configured to provide a layer of point contacts between two layers of circular bodies or between a layer of circular bodies and the inner and/or outer plate.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is Divisional of U.S. Application No. 15/734,882, filedon Dec. 3, 2020, which is a 371 National Stage Entry ofPCT/EP2019/061897, filed on May 9, 2019, which claims priority of EPapplication 18175898.8 which was filed on Jun. 5, 2018 and which isincorporated herein in its entirety by reference.

FIELD

The present invention relates to an assembly for use in a magneticlevitation and/or acceleration motor system of a lithographic apparatus.The assembly comprising a cryostat and a layer of superconducting coils.

BACKGROUND

A lithographic apparatus is a machine constructed to apply a desiredpattern onto a substrate. A lithographic apparatus can be used, forexample, in the manufacture of integrated circuits (ICs). A lithographicapparatus may, for example, project a pattern (also often referred to as“design layout” or “design”) of a patterning device (e.g., a mask) ontoa layer of radiation-sensitive material (resist) provided on a substrate(e.g., a wafer).

As semiconductor manufacturing processes continue to advance, thedimensions of circuit elements have continually been reduced while theamount of functional elements, such as transistors, per device has beensteadily increasing over decades, following a trend commonly referred toas ‘Moore’s law’. To keep up with Moore’s law the semiconductor industryis chasing technologies that enable to create increasingly smallerfeatures. To project a pattern on a substrate a lithographic apparatusmay use electromagnetic radiation. The wavelength of this radiationdetermines the minimum size of features which are patterned on thesubstrate. Typical wavelengths currently in use are 365 nm (i-line), 248nm, 193 nm and 13.5 nm. A lithographic apparatus, which uses extremeultraviolet (EUV) radiation, having a wavelength within a range of 4 nmto 20 nm, for example 6.7 nm or 13.5 nm, may be used to form smallerfeatures on a substrate than a lithographic apparatus which uses, forexample, radiation with a wavelength of 193 nm.

In a lithographic apparatus a patterning device is subjected to aradiation beam. Whilst passing through the patterning device, a patternis imparted to this radiation beam. Subsequently, the radiation beamwith imparted pattern passes through a projection system, which projectsthe imparted pattern onto a substrate. In order to provide the substratewith a desired pattern, both the patterning device and the substrate aremoved with respect to the projection system as well as with respect toeach other. For this purpose linear and/or planar motor systems are usedbased on current conducting coils and permanent magnets at roomtemperature or higher due to heat developed by the coils. Linear andplanar motor systems typically have a stator part and a mover part whichis movable in controlled manner with respect to the stator part bymanipulating the current through the current conducting coils.

SUMMARY

Analytical relations show that the magnetic field density in the coilsof the mover of a linear or planar motor system can be improved a factor4-5 by using superconducting electromagnets at a temperature of 4 K. Inpractise superconductors are available which are superconducting athigher cryogenic temperatures in the range of 70 K to 150 K. In order toput this superconducting electro magnets into practice a thermalinsulation from the cryogenic temperature required to room temperatureis needed which has to fit within a small stack height. Otherwise thedistance between the coils of the mover and the superconducting magnetsincreases due to the insulation to an extent that the increase ofmagnetic field density in the coils is lost. There is therefore a needfor a thermal insulation layer of small height.

Linear and planar motor systems used in a lithographic apparatus aretypically used based on current conducting coils and magnets. Linear andplanar motor systems used in a lithographic apparatus further typicallyhave a stator part and a mover part which is movable in controlledmanner with respect to the stator part by manipulating the currentthrough the current conducting coils. It is realized that a) the magnetscan be provided in the stator part and the current conducting coils inthe mover part or, the other way around, the magnets can be provided inthe mover part and the current conducting coils in the stator part, onthe one hand, and that b) not only the magnets may be superconductingmagnets having superconducting coils but additionally or alternativelythe current conducting coils may be superconducting coils, on the otherhand.

Taking all this into account, the present invention has as its object toprovide an assembly comprising a cryostat and a coils layer ofsuperconducting coils, the coil layer being flat and configured for usein or with a magnetic levitation and/or acceleration motor system of alithographic apparatus.

According to a first aspect of the invention, there is provided anassembly comprising a cryostat and a coil layer of superconductingcoils, wherein the coil layer is configured for use in or with amagnetic levitation and/or acceleration motor system of a lithographicapparatus, is flat and defines two opposing layer faces.

The coil layer may be configured as a stator part of a magneticlevitation and/or acceleration motor system and/or as a mover part of amagnetic levitation and/or acceleration motor system. Further the coillayer may be wired for alternating current operation and/or may be anarray of electromagnets wired for direct current operation.

The magnetic levitation and/or acceleration motor system may be a linearmotor system or a planar motor system.

The cryostat comprises two insulation coverings. The coil layer and twoinsulation coverings are arranged in a sandwich manner, with the coillayer arranged between the two insulation coverings and each of the twoopposing layer faces of the coil layer covered by one of the insulationcoverings in order to be able to keep the coil layer at a cryogeniccondition required superconductivity of the coils.

The insulation coverings each comprise: an inner plate and an outerplate parallel to the inner plate, the inner plate being arrangedbetween the outer plate and the coil layer, and an insulation systemarranged between the inner plate and the outer plate. The inner plateand/or outer plate may be from a stainless steel alloy.

The insulation system is configured to have a vacuum layer. A vacuumlayer in the insulation system reduces the thermal conductivity betweenthe inner plate and outer plate. This vacuum may be a vacuum of 10⁻³ Paor lower. When the mover is in an ambient of normal air pressure, thisresults in that the insulation covering has to be able to withstand apressure difference of 1 bar. Taking into account that in planar motorsystems for moving the substrate in a lithographic apparatus, the statortypically has a surface in the order of 1 meter by 2 meter, or larger,this means that the thermal insulation must be able to withstand largeforces.

The inner plates are configured for being cryocooled in order to bringand maintain the coil layer at cryogenic condition.

The insulation system of one or both said insulation coverings:

-   comprises, in the vacuum layer, one or more layers of at least    partly circular bodies each defining an at least partly circular    contour and a central axis extending through a center of the    circular contour as well as perpendicular to the circular contour,    the central axes of the bodies of each layer of circular bodies    extending perpendicular to the inner and outer plate, and-   is configured to provide at least one layer of point contacts    between two said layers of circular bodies or between a said layer    of circular bodies and the inner and/or outer plate such that each    possible thermal conductive path between the inner and outer plate    has to pass, at some place, through at least one point contact.

The layers of circular bodies are arranged between the inner and outerplate and support the inner plate on the outer plate - when the innerplate lies above the outer plate - or the outer plate on the innerplate - when the outer plate lies above the inner plate -. Circularbodies have a high load-bearing capacity, on the one hand, whilstproviding a point contact, on the other hand. As a point contact has avery small contact surface, the thermal conductivity through the pointcontact is very low. With one or more layers of circular bodies havingtheir central axes perpendicular to the inner and outer plate andconfigured to provide at least one layer of point contacts it is ensuredthat each possible thermal conductive path between the inner and outerplate has to pass, at some place, through at least one point contact.This results in an insulation covering having minimal thermalconductivity, on the one hand, and high load bearing capacity on theother hand.

The circular bodies may be fully circular or partly circular having apartly circular contour extending over an angle of 180° or less, like60-120°. The circular bodies may be spherical bodies, like spheresand/or half-spheres, and/or straight cylindrical bodies, like cylindersand/or half-cylinders. For example, in case of half-spheres orhalf-cylinders, the half-spheres respectively half-cylinders may beglued onto the face of the inner plate facing the outer plate and/oronto the face of the outer plate facing the inner plate, and stackedonto each other resulting in a said layer of point contacts betweenhalf-spheres, between half-cylinders, or between half-spheres andhalf-cylinders.

Defining the diameter of a said circular body as twice the radius fromthe center of the circular contour to the circular contour, the diameterof the at least partly circular bodies may, according to a furtherembodiment, be smaller than 7 mm, such as smaller than 5 mm. Thediameter may be in the range of 0.1 to 5 mm, such as in the range of 0.5to 4 mm. Circular bodies with such a diameter are readily available, forexample as spheres for ball bearings or as cylinders for needle bearingsor as wires. Further, circular bodies of such diameter allow insulationcoverings with a thickness - perpendicular to the inner and outerplate - of less than 10 mm. Even a thickness much lower is possibleand/or multiple layers of point contact are possible with smallerdiameters whilst still keeping the total thickness of the insulationcovering below 10 mm. The thickness may for example be at most 7-8 mm.

The point contacts, in a said layer of point contacts, may, according toa further embodiment, be arranged with a pitch of 5-20 mm, for example apitch of 10-15 mm.

According to an embodiment of the assembly, the circular bodies may bemade from a material chosen from one or more of the group of: zirconia,Kevlar, Kevlar composites, Kevlar fiber composites, glass, glasscomposites, glass fiber composites, and titanium alloys. These materialsare commercially available in the form of wires and spheres, have alarge strength and low thermal conductivity.

According to an embodiment of the assembly, the circular bodies may bemade from a material having a ratio of the Young modulus with respect tothe integral of the thermal conductivity coefficient over thetemperature range of 4 K to 80 K, which is at least 1 N/Wm, such as atleast 1.5 N/Wm. Expressed in a formula, this ratio is:

E /(∫₄⁸⁰λ(T)dT) ≥ 1 N/Wm,

such as

E /(∫₄⁸⁰λ(T)dT) ≥ 1N / Wm > 1.5 N/Wm

According to a further embodiment of the assembly, at least one saidlayers of spherical bodies may comprise spheres and a spacer plateprovided with a pattern of circular through holes for accommodating thespheres, each through hole having a diameter configured to contact asaid sphere such that the spacer plate is supported by the spheres,wherein the spacer plate is arranged parallel to the inner plate andouter plate. Viewed perpendicular to the spacer plate, the spacer plateis arranged at a distance from each of opposing ends of the spheres.This spacer plate prevents the spheres from rolling away by keeping themat locations determined by the through holes. In this embodiment thespacer plate may be configured for being cooled, like cryocooled, at atemperature between a temperature of the inner plate and a temperatureof the outer plate. The spacer plate than additionally serves asinsulation shield increasing the thermal insulation considerable. Thediameter of the through holes may in this embodiment for example be inthe range of 70-100%, such as 90-100%, of the diameter of the spheres.Further, in this embodiment, the thermal expansion coefficient of thespacer plate may be larger than the thermal expansion coefficient of thespheres such that when the spacer plate and spheres are cooled down ashrunk connection between the spacer plate and spheres is obtained inthe through holes. This shrunk connection may provide a sealing closingthe through hole with respect to the sphere, which improves theinsulation capacity of the insulation system. For this purpose, thespacer plate may be made from aluminum or an aluminum alloy.

According to a further embodiment of the assembly, the assembly maycomprise a multiple of said layers of spherical bodies, wherein betweenadjacent ones of said layers of spherical bodies a separation plate isarranged which provides on each side an additional layer of pointcontacts between the separation plate and spherical bodies. In thisembodiment, the separation plate may be configured for being cooled,like cryocooled, at a temperature between a temperature of the innerplate and a temperature of the outer plate.

According to another further embodiment of the assembly, said one ormore layers of circular bodies may comprise at least one set of twolayers of straight cylindrical bodies, such as cylinders and/orhalf-cylinders; wherein the cylindrical bodies of a first of said twolayers are arranged parallel to each other with a spacing betweenadjacent cylindrical bodies and the cylindrical bodies of a second ofsaid two layers are arranged parallel to each other with a spacingbetween adjacent cylindrical bodies; and wherein the first layer andsecond layer are stacked directly onto each other with the cylindricalbodies of the first layer crosswise with respect to the cylindricalbodies of the second layer to provide, between the cylindrical bodies ofthe first layer and the cylindrical bodies of the second layer, a saidlayer of point contacts. In this embodiment, the cylindrical bodies maybe wires. Crosswise may be at an angle of 90° or at any other angle,like an angle in the range of 30° to 90°, for example an angle of about60°.

According to a further embodiment of the assembly, the assembly mayfurther comprise a cryocooler system configured for cryocooling theinner plates.

According to a further embodiment of the assembly, the assembly mayfurther comprise a vacuum system configured to provide in the vacuumlayer a vacuum of 10⁻³ Pa or lower.

According to a further aspect, the invention relates to a lithographicapparatus provided with an assembly according to the invention. Such alithographic apparatus may comprise a mask support constructed tosupport a patterning device, a first positioner configured to positionthe mask support with respect to the first positioner, a substratesupport constructed to hold a substrate, a second positioner configuredto position the substrate support with respect to the second positioner,and a projection system configured to project a pattern imparted to aradiation beam by the patterning device onto a target position on thesubstrate; wherein one or more of the items ‘the mask support, the firstpositioner, the substrate support, and the second positioner’ areprovided with an assembly according to the invention.

BRIEF DESCRIPTION OF THE DRAWINGS

Embodiments of the invention will now be described, by way of exampleonly, with reference to the accompanying schematic drawings, in which:

FIG. 1 depicts a schematic overview of a lithographic apparatus;

FIG. 2 depicts a detailed view of a part of the lithographic apparatusof FIG. 1 ;

FIG. 3 schematically depicts a position control system;

FIG. 4 schematically depicts a cross section of a planar motor systemprovided with an embodiment of the assembly according to the invention;

FIG. 5 schematically depicts in top view a planar motor system;

FIG. 6 schematically depicts a second embodiment of an insulationcovering of an assembly according to the invention;

FIG. 7 schematically depicts a third embodiment of an insulationcovering of an assembly according to the invention; and

FIG. 8 schematically depicts a detail of a fourth embodiment of aninsulation covering of an assembly according to the invention.

DETAILED DESCRIPTION

In the present document, the terms “radiation” and “beam” are used toencompass all types of electromagnetic radiation, including ultravioletradiation (e.g. with a wavelength of 365, 248, 193, 157 or 126 nm) andEUV (extreme ultra-violet radiation, e.g. having a wavelength in therange of about 5-100 nm).

The term “reticle”, “mask” or “patterning device” as employed in thistext may be broadly interpreted as referring to a generic patterningdevice that can be used to endow an incoming radiation beam with apatterned cross-section, corresponding to a pattern that is to becreated in a target portion of the substrate. The term “light valve” canalso be used in this context. Besides the classic mask (transmissive orreflective, binary, phase-shifting, hybrid, etc.), examples of othersuch patterning devices include a programmable mirror array and aprogrammable LCD array.

FIG. 1 schematically depicts a lithographic apparatus LA. Thelithographic apparatus LA includes an illumination system (also referredto as illuminator) IL configured to condition a radiation beam B (e.g.,UV radiation, DUV radiation or EUV radiation), a mask support (e.g., amask table) MT constructed to support a patterning device (e.g., a mask)MA and connected to a first positioner PM configured to accuratelyposition the patterning device MA in accordance with certain parameters,a substrate support (e.g., a wafer table) WT constructed to hold asubstrate (e.g., a resist coated wafer) W and connected to a secondpositioner PW configured to accurately position the substrate support inaccordance with certain parameters, and a projection system (e.g., arefractive projection lens system) PS configured to project a patternimparted to the radiation beam B by patterning device MA onto a targetportion C (e.g., comprising one or more dies) of the substrate W.

The assembly according to the invention - which will be elucidatedfurther below -may be used in the first positioner PM and/or masksupport MT. Further, in addition or alternatively the assembly accordingto the invention - which will be elucidated further below - may be usedin the second positioner PW and/or substrate support WT.

In operation, the illumination system IL receives a radiation beam froma radiation source SO, e.g. via a beam delivery system BD. Theillumination system IL may include various types of optical components,such as refractive, reflective, magnetic, electromagnetic,electrostatic, and/or other types of optical components, or anycombination thereof, for directing, shaping, and/or controllingradiation. The illuminator IL may be used to condition the radiationbeam B to have a desired spatial and angular intensity distribution inits cross section at a plane of the patterning device MA.

The term “projection system” PS used herein should be broadlyinterpreted as encompassing various types of projection systems,including refractive, reflective, catadioptric, anamorphic, magnetic,electromagnetic and/or electrostatic optical systems, or any combinationthereof, as appropriate for the exposure radiation being used, and/orfor other factors such as the use of an immersion liquid or the use of avacuum. Any use of the term “projection lens” herein may be consideredas synonymous with the more general term “projection system” PS.

The lithographic apparatus LA may be of a type wherein at least aportion of the substrate may be covered by a liquid having a relativelyhigh refractive index, e.g., water, so as to fill a space between theprojection system PS and the substrate W - which is also referred to asimmersion lithography. More information on immersion techniques is givenin US6952253, which is incorporated herein by reference.

The lithographic apparatus LA may also be of a type having two or moresubstrate supports WT (also named “dual stage”). In such “multiplestage” machine, the substrate supports WT may be used in parallel,and/or steps in preparation of a subsequent exposure of the substrate Wmay be carried out on the substrate W located on one of the substratesupport WT while another substrate W on the other substrate support WTis being used for exposing a pattern on the other substrate W. Also incase of two or more substrate supports WT, the assembly according to theinvention - which will be elucidated further below - may be used in thesecond positioner PW and/or the two or more substrate supports.

In addition to the substrate support WT, the lithographic apparatus LAmay comprise a measurement stage. The measurement stage is arranged tohold a sensor and/or a cleaning device. The sensor may be arranged tomeasure a property of the projection system PS or a property of theradiation beam B. The measurement stage may hold multiple sensors. Thecleaning device may be arranged to clean part of the lithographicapparatus, for example a part of the projection system PS or a part of asystem that provides the immersion liquid. The measurement stage maymove beneath the projection system PS when the substrate support WT isaway from the projection system PS.

In operation, the radiation beam B is incident on the patterning device,e.g. mask, MA which is held on the mask support MT, and is patterned bythe pattern (design layout) present on patterning device MA. Havingtraversed the patterning device MA, the radiation beam B passes throughthe projection system PS, which focuses the beam onto a target portion Cof the substrate W. With the aid of the second positioner PW and aposition measurement system PMS, the substrate support WT can be movedaccurately, e.g., so as to position different target portions C in thepath of the radiation beam B at a focused and aligned position.Similarly, the first positioner PM and possibly another position sensor(which is not explicitly depicted in FIG. 1 ) may be used to accuratelyposition the patterning device MA with respect to the path of theradiation beam B. Patterning device MA and substrate W may be alignedusing mask alignment marks M1, M2 and substrate alignment marks P1, P2.Although the substrate alignment marks P1, P2 as illustrated occupydedicated target portions, they may be located in spaces between targetportions. Substrate alignment marks P1, P2 are known as scribe-lanealignment marks when these are located between the target portions C.

To clarify the invention, a Cartesian coordinate system is used. TheCartesian coordinate system has three axis, i.e., an x-axis, a y-axisand a z-axis. Each of the three axis is orthogonal to the other twoaxis. A rotation around the x-axis is referred to as an Rx-rotation. Arotation around the y-axis is referred to as an Ry-rotation. A rotationaround about the z-axis is referred to as an Rz-rotation. The x-axis andthe y-axis define a horizontal plane, whereas the z-axis is in avertical direction. The Cartesian coordinate system is not limiting theinvention and is used for clarification only. Instead, anothercoordinate system, such as a cylindrical coordinate system, may be usedto clarify the invention. The orientation of the Cartesian coordinatesystem may be different, for example, such that the z-axis has acomponent along the horizontal plane.

FIG. 2 shows a more detailed view of a part of the lithographicapparatus LA of FIG. 1 . The lithographic apparatus LA may be providedwith a base frame BF, a balance mass BM, a metrology frame MF and avibration isolation system IS. The metrology frame MF supports theprojection system PS. Additionally, the metrology frame MF may support apart of the position measurement system PMS. The metrology frame MF issupported by the base frame BF via the vibration isolation system IS.The vibration isolation system IS is arranged to prevent or reducevibrations from propagating from the base frame BF to the metrologyframe MF.

The second positioner PW is arranged to accelerate the substrate supportWT by providing a driving force between the substrate support WT and thebalance mass BM. The driving force accelerates the substrate support WTin a desired direction. Due to the conservation of momentum, the drivingforce is also applied to the balance mass BM with equal magnitude, butat a direction opposite to the desired direction. Typically, the mass ofthe balance mass BM is significantly larger than the masses of themoving part of the second positioner PW and the substrate support WT.

In an embodiment, the second positioner PW is supported by the balancemass BM. For example, wherein the second positioner PW comprises a partof a planar motor system to levitate or accelerate the substrate supportWT above and/or relative to the balance mass BM. This planar motorsystem may be a magnetic levitation and/or acceleration motor systemprovided with an assembly according to the invention - which will beelucidated further below -. In another embodiment, the second positionerPW is supported by the base frame BF. For example, wherein the secondpositioner PW comprises a stator of linear motor and wherein the secondpositioner PW comprises a bearing, like a gas bearing, to levitate thesubstrate support WT above the base frame BF. According to anotherexample, the second positioner may comprise a linear motor systemprovided with an assembly according to the invention - which will beelucidated further below -.

The position measurement system PMS may comprise any type of sensor thatis suitable to determine a position of the substrate support WT. Theposition measurement system PMS may comprise any type of sensor that issuitable to determine a position of the mask support MT. The sensor maybe an optical sensor such as an interferometer or an encoder. Theposition measurement system PMS may comprise a combined system of aninterferometer and an encoder. The sensor may be another type of sensor,such as a magnetic sensor, a capacitive sensor or an inductive sensor.The position measurement system PMS may determine the position relativeto a reference, for example the metrology frame MF or the projectionsystem PS. The position measurement system PMS may determine theposition of the substrate table WT and/or the mask support MT bymeasuring the position or by measuring a time derivative of theposition, such as velocity or acceleration.

The position measurement system PMS may comprise an encoder system. Anencoder system is known from for example, United States patentapplication US2007/0058173A1, filed on Sep. 7, 2006, hereby incorporatedby reference. The encoder system comprises an encoder head, a gratingand a sensor. The encoder system may receive a primary radiation beamand a secondary radiation beam. Both the primary radiation beam as wellas the secondary radiation beam originate from the same radiation beam,i.e., the original radiation beam. At least one of the primary radiationbeam and the secondary radiation beam is created by diffracting theoriginal radiation beam with the grating. If both the primary radiationbeam and the secondary radiation beam are created by diffracting theoriginal radiation beam with the grating, the primary radiation beamneeds to have a different diffraction order than the secondary radiationbeam. Different diffraction orders are, for example,+1^(st) order,-1^(st) order, +2^(nd) order and -2^(nd) order. The encoder systemoptically combines the primary radiation beam and the secondaryradiation beam into a combined radiation beam. A sensor in the encoderhead determines a phase or phase difference of the combined radiationbeam. The sensor generates a signal based on the phase or phasedifference. The signal is representative of a position of the encoderhead relative to the grating. One of the encoder head and the gratingmay be arranged on the substrate structure WT. The other of the encoderhead and the grating may be arranged on the metrology frame MF or thebase frame BF. For example, a plurality of encoder heads are arranged onthe metrology frame MF, whereas a grating is arranged on a top surfaceof the substrate support WT. In another example, a grating is arrangedon a bottom surface of the substrate support WT, and an encoder head isarranged below the substrate support WT.

The position measurement system PMS may comprise an interferometersystem. An interferometer system is known from, for example, U.S. Pat.US6,020,964, filed on Jul. 13, 1998, hereby incorporated by reference.The interferometer system may comprise a beam splitter, a mirror, areference mirror and a sensor. A beam of radiation is split by the beamsplitter into a reference beam and a measurement beam. The measurementbeam propagates to the mirror and is reflected by the mirror back to thebeam splitter. The reference beam propagates to the reference mirror andis reflected by the reference mirror back to the beam splitter. At thebeam splitter, the measurement beam and the reference beam are combinedinto a combined radiation beam. The combined radiation beam is incidenton the sensor. The sensor determines a phase or a frequency of thecombined radiation beam. The sensor generates a signal based on thephase or the frequency. The signal is representative of a displacementof the mirror. In an embodiment, the mirror is connected to thesubstrate support WT. The reference mirror may be connected to themetrology frame MF. In an embodiment, the measurement beam and thereference beam are combined into a combined radiation beam by anadditional optical component instead of the beam splitter.

The first positioner PM may comprise a long-stroke module and ashort-stroke module. The short-stroke module is arranged to move themask support MT relative to the long-stroke module with a high accuracyover a small range of movement. The long-stroke module is arranged tomove the short-stroke module relative to the projection system PS with arelatively low accuracy over a large range of movement. With thecombination of the long-stroke module and the short-stroke module, thefirst positioner PM is able to move the mask support MT relative to theprojection system PS with a high accuracy over a large range ofmovement. Similarly, the second positioner PW may comprise a long-strokemodule and a short-stroke module. The short-stroke module is arranged tomove the substrate support WT relative to the long-stroke module with ahigh accuracy over a small range of movement. The long-stroke module isarranged to move the short-stroke module relative to the projectionsystem PS with a relatively low accuracy over a large range of movement.With the combination of the long-stroke module and the short-strokemodule, the second positioner PW is able to move the substrate supportWT relative to the projection system PS with a high accuracy over alarge range of movement.

The first positioner PM and the second positioner PW each are providedwith an actuator to move respectively the mask support MT and thesubstrate support WT. The actuator of the first positioner and/or secondpositioner may be a linear actuator to provide a driving force along asingle axis, for example the y-axis. This linear actuator may beprovided with an assembly according to the invention. Multiple linearactuators, which may be provided with an assembly according to theinvention, may be applied to provide driving forces along multiple axis.The actuator may be a planar actuator to provide a driving force alongmultiple axis. This planar actuator may be provided with an assemblyaccording to the invention. For example, the planar actuator may bearranged to move the substrate support WT in 6 degrees of freedom. Theactuator may be an electro-magnetic actuator comprising at least onecoil and at least one magnet. The actuator is arranged to move the atleast one coil relative to the at least one magnet by applying anelectrical current to the at least one coil. The actuator may be amoving-magnet type actuator, which has the at least one magnet coupledto the substrate support WT respectively to the mask support MT. Theactuator may be a moving-coil type actuator which has the at least onecoil coupled to the substrate support WT respectively to the masksupport MT. The actuator may be a voice-coil actuator, a reluctanceactuator, a Lorentz-actuator or a piezo-actuator, or any other suitableactuator.

The lithographic apparatus LA comprises a position control system PCS asschematically depicted in FIG. 3 . The position control system PCScomprises a setpoint generator SP, a feedforward controller FF and afeedback controller FB. The position control system PCS provides a drivesignal to the actuator ACT. The actuator ACT may be the actuator of thefirst positioner PM or the second positioner PW. The actuator ACT drivesthe plant P, which may comprise the substrate support WT or the masksupport MT. An output of the plant P is a position quantity such asposition or velocity or acceleration. The position quantity is measuredwith the position measurement system PMS. The position measurementsystem PMS generates a signal, which is a position signal representativeof the position quantity of the plant P. The setpoint generator SPgenerates a signal, which is a reference signal representative of adesired position quantity of the plant P. For example, the referencesignal represents a desired trajectory of the substrate support WT. Adifference between the reference signal and the position signal forms aninput for the feedback controller FB. Based on the input, the feedbackcontroller FB provides at least part of the drive signal for theactuator ACT. The reference signal may form an input for the feedforwardcontroller FF. Based on the input, the feedforward controller FFprovides at least part of the drive signal for the actuator ACT. Thefeedforward FF may make use of information about dynamicalcharacteristics of the plant P, such as mass, stiffness, resonance modesand eigenfrequencies.

FIG. 4 shows, schematically, a side cross-section of magnetic levitationand/or acceleration motor system 1 according to the invention, whichsystem has a flat coil layer 3 of electromagnets 2 and is provided withan assembly 6, 7, 8, 9 according to the invention. Due to the coil layer3 being flat, this magnetic levitation and/or acceleration motor system1 is a linear motor system or planar motor system. The coil layer 3 isflat, because the electromagnets 2 are arranged in a plane. In theexample of FIG. 4 , it is a planar motor system. In the example shown,this planar motor system 1 is used in the wafer stage of a lithographicapparatus. For this purpose, the substrate W, substrate support WT andsecond positioner PW are indicated with the same references as used inFIGS. 1-3 . In addition or alternatively, the magnetic levitation and/oracceleration motor system 1 according to the invention may also be usedas a planar or linear motor system in the mask stage of a lithographicapparatus, in which case the substrate W may be the patterning device MA(e.g. a mask), the substrate support WT may be the mask support MT andthe second positioner PW may be the first positioner PM.

FIG. 5 shows a detail of FIG. 4 , which details are shown in FIG. 4 incross-section according the arrows IV as indicated in FIG. 5 .

In the embodiments of FIGS. 4 and 5 the assembly according to theinvention is provided in the stator part of the planar motor system 1.The mover part of this planar motor system, in this example indicated asWT, is at its underside provided with a flat layer of conducting coils21, 22 in which the current can be manipulated by means of a controllerin order to control the position of the mover part WT with respect tothe stator part PW; 8, 3, 9.

The assembly according to the invention comprises a cryostat 6, 7, 8 and9 configured to cryocool the superconducting electromagnets 2 in thecoil layer 3 at a cryogenic temperature, for example a temperature below30 K as indicated in FIG. 4 . Taking into account that presently thereare materials available which are superconducting in the range of 70 Kto 150 K, this temperature may also be higher than 30 K.

In the embodiments of FIGS. 4 and 5 , the coil layer 3 is a layer ofsuperconducting electromagnets 2. The coil layer is flat and hasopposing layer faces 4, 5. In FIG. 4 , layer face 4 is the lower face ofthe coil layer 3 and layer face 5 is the upper face of coil layer 3.

The cryostat comprises a cryocooler system 6, a vacuum system 7, and twoinsulation coverings 8, 9. The coil layer 3 and two insulation coverings8, 9 are arranged in a sandwich manner, with the coil layer 3 arrangedbetween the two insulation coverings 8, 9 such that each of the twoopposing layer faces 4, 5 is covered by one of the insulation coverings8, 9.

One of the insulation coverings or both the insulation coverings 8, 9may each comprise an inner plate 10 and an outer plate 11 parallel tothe inner plate 10. The inner plate 10 is closest to the coil layer 3and arranged between the outer plate 11 and the coil layer 3. One of orboth the insulation coverings 8, 9 may further comprise an insulationsystem 12 arranged between the inner plate 10 and outer plate 11.

The vacuum system is configured to provide a vacuum (layer) 13 in theinsulation system.

The cryocooler system is configured for cryocooling the inner plates 10and is for this purpose at 14 connected with the inner plate 10 of theinsulation covering 9. Because the inner plate 10 of the insulationcovering 8 is thermally connected with the inner plate 10 of theinsulation covering 9, also the inner plate 10 of the insulationcovering will be cryocooled. This thermal connection may for example beprovided via the magnets 2 or not shown thermal bridges.

According to the invention, the insulation system 12 of one or both saidinsulation coverings 8, 9 comprises, in the vacuum (layer) 13, one ormore layers of at least partly circular bodies 101 each defining an atleast partly circular contour 102 and a central axis extending through acenter 103 of the circular contour 102 as well as perpendicular to thecircular contour 102. The central axes of the circular bodies 101 ofeach layer of circular bodies extend perpendicular to the inner plate 10and outer plate 11. In the embodiment as shown in FIG. 4 , the at leastpartly circular bodies are spheres, in this case full-spheres, but thesecircular bodies may also be half-spheres or straight cylindrical bodies,e.g. full-cylindrical bodies or half-cylindrical bodies. The term‘full-’ relates specifically to the outer contour of the circular bodiesnot to the inner of the circular bodies. The inner of a full-circularbodies may for example be hollow or a full-circular body may have athrough bore in order to save weight and/or to reduce the thermalconductivity of the bodies.

The insulation covering 8, 9 according to the invention is furthermoreconfigured to provide at least one layer 104, 105 of point contacts 106between two said layers of circular bodies 101 or between a said layerof circular bodies 101 and the inner plate 10 and/or outer plate 11.This configuration is such that each possible thermal conductive pathbetween the inner plate 10 and outer plate 11 has to pass, at someplace, through at least one point contact 106. This results in aninsulation covering having minimal thermal conductivity due to the layerof point contacts, on the one hand, and high load bearing capacity dueto the at least partly circular bodies on the other hand. In the exampleof FIG. 4 , there are two layers 104 and 105 of point contacts 106. Onelayer 105 at the side of the outer plates 11 and one layer 104 at theside of the inner plates.

In the embodiment of FIG. 4 , the circular bodies 101 may be(full-)spheres of zirconium with a diameter of 7 mm. These spheres liebetween the inner plate 10 and outer plate 11. In a linear motor thevertical distance D between the layer 3 of electro-magnets 2 and theconducting coils 21, 22 is limited. This means that the verticalthickness (in the direction of double arrow D) of especially theinsulation covering 8 is to be kept low. With an aluminum inner plate 10and aluminum outer plate 11 of each 0.75 mm thickness and spheres with adiameter of 7 mm, the total thickness of the insulation covering isabout 9 mm. This thickness can easily be reduced by using a thinnerinner plate 10 and thinner outer plate 11 and/or by using spheres 101 ofsmaller diameter. In this respect it is to be noted that zirconiumspheres with diameters as from 0.2 mm can be readily obtained in themarket against low prices.

Also the insulation covering 9 can be designed very thin, but takinginto account that on this side of the layer 3 of superconductingelectromagnets 2 space is in general not a real issue, the spheres 101in the insulation covering 9 can be taken larger than the spheres 101 inthe insulation covering 8. The spheres in the insulation covering mayfor example be in the range of 15-20 mm.

In order to prevent these spheres from rolling away, a spacer plate 107may be provided. This spacer plate 107 may be provided with a pattern ofthrough holes, each having a diameter in the range of 70-100% of thediameter of the spheres. By using a spacer plate with a thermalexpansion coefficient larger than the thermal expansion coefficient ofthe spheres, a sealing shrunk connection between the spheres 101 andspacer plate 107 is obtained when the inner plate is cryocooled.Further, the spacer plate 107 may be kept at a temperature of in thisexample about 80 K by the crycooler. For this purpose the crycooler 6 isat 108 connected with the spacer plate 107 of the insulation covering 9(and/or 8, not shown). The spacer plate 107 then serves as a shieldwhich improves the insulation capacity of the insulation covering 8, 9.In order to cool both the spacer plates 107, the spacer plates 107 arethermally connected by thermal connection 109.

As shown in FIG. 4 by means of the indicated temperatures, the substratesupport WT may be at room temperature, the coils 21 and 22 may have atemperature higher than room temperature due to heat development in thecoils 21 and 22, and the frame 15 may be at room temperature as well.Further the crycooler cryocools both the inner plates 10 at a cryogenictemperature, which will, according to this example, be below 30 K. Toimprove the insulation, the spacer plates 107 are cooled by thecryocooler to have a temperature between the temperature of the innerplates (in this example < 30 K) and the temperature of the outer plates(in his example 295 K). The temperature of the spacer plates may forexample be 80 K.

In the example of FIGS. 4 and 5 , the planar motor system according tothe invention has a stator part provided with a flat layer ofsuperconducting electromagnets 2 and a mover part provided with a flatlayer of normal-conducting coils 21, 22 (which are in general at roomtemperature or higher when, in use, the coils 21, 22 produce heat), seeFIGS. 4 and 5 . It is noted that additionally or alternatively the flatlayer of coils 21 may, according to the invention, be a flat layer ofsuperconducting coils having on both sides or one side of the flat layeran insulation covering 8, 9 according to the invention with at leastpartly circular bodies in a vacuum layer. In this case the coil layer 3may be a coil layer of permanent magnets or normal electromagnets orsuperconducting electromagnets.

As shown in very schematic cross-section in FIGS. 6 and 7 , theinsulation covering 8 and/or insulation covering 9 may also comprisemultiple layers of spheres, separated by intermediate plates.

FIG. 6 shows two layers 200, 210 of spheres 201 and 211, respectively.The spheres 201 in the layer 200 may be maintained in position by aspacer plate 207 and the spheres 211 in the layer 210 may be maintainedin position by a spacer plate 217. The two layers 200 and 210 of spheres201 and 211 may be separated by an intermediate layer 240. Thisconfiguration provides a total of four layers 204, 205, 214 and 215 ofpoint contacts 206 and 216. By using spheres of smaller diameter, thethickness of the insulation covering of FIG. 6 can still be maintainedat or below the 9 mm thickness as mentioned in relation to FIG. 4 .

FIG. 7 shows four layers 300, 310, 320, 330 of spheres 301, 311, 321 and331, respectively. The spheres 301 in the layer 300 may be maintained inposition by a spacer plate 307, the spheres 311 in the layer 310 may bemaintained in position by a spacer plate 317, the spheres 321 in thelayer 320 may be maintained in position by a spacer plate 327, and thespheres 331 in the layer 330 may be maintained in position by a spacerplate 337. The two layers 300 and 310 of spheres 301 and 311 may beseparated by an intermediate layer 340, the two layers 310 and 320 ofspheres 311 and 321 may be separated by an intermediate layer 350, andthe two layers 320 and 330 of spheres 321 and 331 may be separated by anintermediate layer 360. This configuration provides a total of eightlayers 304, 305, 314, 315, 324, 325, 334 and 335 of point contacts 206,216, 226 and 236. By using spheres of smaller diameter, the thickness ofthe insulation covering of FIG. 7 can still be maintained at or belowthe 9 mm thickness as mentioned in relation to FIG. 4 .

As shown in very schematic perspective view in FIG. 8 , an insulationsystem providing at least one layer of point contacts can also beobtained with cross-wise stacked layers of straight cylindrical bodies,like the wires 401 and 402 having a circular circumference 402respectively 412. At the crossings of the wires 401 and 411 there willbe point contacts 406, as schematically indicated at four crossings inFIG. 8 . In the construction of FIG. 8 , the cylindrical bodies 401, 402of each layer being straight and the layers being crosswise stackedensured that each possible thermal conductive path between the inner andouter plate has to pass, at some place, through at least one pointcontact.

The present invention can also be characterized by the followingclauses:

-   1. An assembly comprising a cryostat and a coil layer of    superconducting coils,    -   wherein the coil layer is configured for use in or with a        magnetic levitation and/or acceleration motor system of a        lithographic apparatus, is flat and defines two opposing layer        faces;    -   wherein the cryostat comprises two insulation coverings;    -   wherein the coil layer is arranged between the two insulation        coverings and each of the two opposing layer faces is covered by        one of the insulation coverings;    -   wherein each said insulation covering comprises:        -   an inner plate and an outer plate parallel to the inner            plate, the inner plate being arranged between the outer            plate and the coil layer, and        -   an insulation system arranged between the inner plate and            the outer plate;    -   wherein the insulation system is configured to have a vacuum        layer;    -   wherein the inner plates are configured to be cryocooled; and    -   wherein the insulation system of one or both said insulation        coverings:        -   comprises, in the vacuum layer, one or more layers of at            least partly circular bodies each defining an at least            partly circular contour and a central axis extending through            a center of the circular contour as well as perpendicular to            the circular contour, the central axes of the bodies of each            layer of circular bodies extending perpendicular to the            inner and outer plate, and        -   is configured to provide at least one layer of point            contacts between two said layers of circular bodies or            between a said layer of circular bodies and the inner and/or            outer plate.-   2. Assembly according to clause 1,    -   wherein at least one said layer of circular bodies is a layer of        spherical bodies, such as spheres or half-spheres.-   3. An assembly comprising a cryostat and a coil layer of    superconducting coils,    -   wherein the coil layer is configured for use in or with a        magnetic levitation and/or acceleration motor system of a        lithographic apparatus, is flat and defines two opposing layer        faces;    -   wherein the cryostat comprises two insulation coverings;    -   wherein the coil layer is arranged between the two insulation        coverings and each of the two opposing layer faces is covered by        one of the insulation coverings;    -   wherein each said insulation covering comprises:        -   an inner plate and an outer plate parallel to the inner            plate, the inner plate being arranged between the outer            plate and the coil layer, and        -   an insulation system arranged between the inner plate and            the outer plate;    -   wherein the insulation system is configured to have a vacuum        layer;    -   wherein the inner plates are configured to be cryocooled; and    -   wherein the insulation system of one or both said insulation        coverings comprises, in the vacuum layer, one or more layers of        spherical bodies, such as spheres or half-spheres, at least one        said layers of spherical bodies providing a layer of point        contacts between the layer of spheres and the inner and/or outer        plate.-   4. Assembly according to clause 2 or 3,    -   wherein at least one said layers of spherical bodies comprises        spheres and a spacer plate provided with a pattern of circular        through holes for accommodating the spheres, each through hole        having a diameter configured to contact a said sphere such that        the spacer plate is supported by the spheres, wherein the spacer        plate is arranged parallel to the inner plate and the outer        plate.-   5. Assembly according to clause 4,    -   wherein the diameter of the through holes is in the range of        70-100%, such as 90-100%, of the diameter of the spheres.-   6. Assembly according to one of clauses 4-5,    -   wherein the spacer plate is configured to be cooled at a        temperature between a temperature of the inner plate and a        temperature of the outer plate.-   7. Assembly according to one of clauses 4-6,    -   wherein the thermal expansion coefficient of the spacer plate is        larger than the thermal expansion coefficient of the spheres        such that when the spacer plate and spheres are cooled down a        shrunk connection between the spacer plate and spheres is        obtained in the through holes.-   8. Assembly according to one of clauses 4-7,    -   wherein the spacer plate comprises aluminum or an aluminum        alloy.-   9. Assembly according to one of clauses 2-8, comprising a multiple    of said layers of spherical bodies,    -   wherein between adjacent ones of said layers of spherical bodies        a separation plate is arranged which provides on each side an        additional layer of point contacts between the separation plate        and spherical bodies.-   10. Assembly according to clause 9,    -   wherein the separation plate is configured to be cooled at a        temperature between a temperature of the inner plate and a        temperature of the outer plate.-   11. Assembly according to one of clauses 1-10,    -   wherein said one or more layers of circular bodies comprise at        least one set of two layers of straight cylindrical bodies, such        as cylinders and/or half-cylinders;    -   wherein the cylindrical bodies of a first of said two layers are        arranged parallel to each other with a spacing between adjacent        cylindrical bodies and the cylindrical bodies of a second of        said two layers are arranged parallel to each other with a        spacing between adjacent cylindrical bodies; and    -   wherein the first layer and second layer are stacked directly        onto each other with the cylindrical bodies of the first layer        crosswise with respect to the cylindrical bodies of the second        layer to provide, between the cylindrical bodies of the first        layer and the cylindrical bodies of the second layer, a said        layer of point contacts.-   12. An assembly comprising a cryostat and a coil layer of    superconducting coils, wherein the coil layer is configured for use    in or with a magnetic levitation and/or acceleration motor system of    a lithographic apparatus, is flat and defines two opposing layer    faces,    -   wherein the cryostat comprises two insulation coverings;    -   wherein the coil layer is arranged between the two insulation        coverings and each of the two opposing layer faces is covered by        one of the insulation coverings;    -   wherein each said insulation covering comprises:        -   an inner plate and an outer plate parallel to the inner            plate, the inner plate being arranged between the outer            plate and the coil layer, and        -   an insulation system arranged between the inner plate and            the outer plate;    -   wherein the insulation system is configured to have a vacuum        layer;    -   wherein the inner plates are configured to be cryocooled; and    -   wherein the insulation system of one or both said insulation        coverings comprises, in the vacuum layer, comprises at least one        set of two layers of straight cylindrical bodies, such as        cylinders and/or half-cylinders;    -   wherein the cylindrical bodies of a first of said two layers are        arranged parallel to each other with a spacing between adjacent        cylindrical bodies and the cylindrical bodies of a second of        said two layers are arranged parallel to each other with a        spacing between adjacent cylindrical bodies; and    -   wherein the first layer and second layer are stacked directly        onto each other with the cylindrical bodies of the first layer        crosswise with respect to the cylindrical bodies of the second        layer to provide, between the cylindrical bodies of the first        layer and the cylindrical bodies of the second layer, a layer of        point contacts.-   13. Assembly according to one of clauses 11-12,    -   wherein the cylindrical bodies are wires.-   14. Assembly according to one of the preceding clauses,    -   wherein the at least partly circular bodies have a diameter        defined as twice a radius from a center of the circular contour        to the circular contour; and    -   wherein the diameter is smaller than 7 mm, such as smaller than        5 mm.-   15. Assembly according to clause 14,    -   wherein the diameter is in the range of 0.1 to 5 mm, such as in        the range of 0.5 to 4 mm.-   16. Assembly according to one of the preceding clauses,    -   wherein the point contacts, in a said layer of point contacts,        are arranged with a pitch of 5-20 mm, such as a pitch of 10-15        mm.-   17. Assembly according to one of the preceding clauses,    -   wherein one of said insulation coverings has a thickness of at        most 10 mm, such as at most 7-8 mm, the thickness being defined        in a direction perpendicular to the inner and outer plate.-   18. Assembly according to one of the preceding clauses,    -   wherein the circular bodies are made from a material chosen from        one or more of the group of:    -   zirconia, Kevlar, Kevlar composites, Kevlar fiber composites,        glass, glass composites, glass fiber composites, and titanium        alloys.-   19. Assembly according to one of the preceding clauses, wherein the    circular bodies are made    -   from a material having a ratio of the Young modulus with respect        to the integral of the thermal conductivity coefficient over the        temperature range of 4 K to 80 K, which is at least 1 N/Wm, such        as at least 1.5 N/Wm.-   20. Assembly according to one of the preceding clauses, further    comprising a cryocooler system configured for cryocooling the inner    plates to a temperature lower than 30 K, such as lower than 10 K,    like in the range of 0 - 4 K.-   21. Assembly according to one of the preceding clauses, further    comprising a vacuum system configured to provide in the insulation    system a vacuum of 10⁻³ Pa or lower.-   22. Assembly according to one of the preceding clauses,    -   wherein the inner and/or outer plate are made from a stainless        steel alloy.-   23. Assembly according to one of the preceding clauses,    -   wherein the coil layer is configured as a stator part of the        magnetic levitation and/or acceleration motor system.-   24. Assembly according to one of the preceding clauses,    -   wherein the coil layer is configured as a mover part of the        magnetic levitation and/or acceleration motor system.-   25. Assembly according to one of the preceding clauses,    -   wherein the coil layer of super conducting coils is an array of        superconducting electromagnets, each electromagnet having a        north-south axis extending perpendicular to the coil layer;    -   wherein the array of electromagnets is configured such that        adjacent electromagnets have opposite polarity; and    -   wherein the array of electromagnets is wired for direct current        operation.-   26. Assembly according to one of the preceding clauses,    -   wherein the coil layer of superconducting coils is wired for        alternating current operation.-   27. Assembly according to one of the preceding clauses, wherein the    magnetic levitation and/or acceleration motor system is a linear    motor system.-   28. Assembly according to one of the preceding clauses, wherein the    magnetic levitation and/or acceleration motor system is a planar    motor system.-   29. A lithographic apparatus comprising at least one flat magnetic    levitation and/or acceleration motor system provided with an    assembly according to one of the preceding clauses.-   30. A lithographic apparatus, comprising:    -   a mask support constructed to support a patterning device,    -   a first positioner configured to position the mask support with        respect to the first positioner,    -   a substrate support constructed to hold a substrate,    -   a second positioner configured to position the substrate support        with respect to the second positioner, and    -   a projection system configured to project a pattern imparted to        a radiation beam by the patterning device onto a target position        on the substrate;

    wherein one or more of the following items:    -   the mask support,    -   the first positioner,    -   the substrate support, and    -   the second positioner,

    are provided with an assembly according to one of the clauses 1-28.

GENERAL STATEMENTS

In accordance with the present invention, ‘cryogenic cooling’ or‘cooling the coil layer to a cryogenic temperature’ refers to a processof cooling the coil layer to such a temperature that the coils exhibit asuperconductive behavior and keeping the coils at such a temperature. Assuch, when cooled to such a temperature, the coils may be supplied withan electrical current, substantially without generating Ohmic losses. Aswill be appreciated by the skilled person, the required temperature orcooling may depend on the material or composition of the applied coilsand/or the pressure conditions prevailing.

Although specific reference may be made in this text to the use of alithographic apparatus in the manufacture of ICs, it should beunderstood that the lithographic apparatus described herein may haveother applications. Possible other applications include the manufactureof integrated optical systems, guidance and detection patterns formagnetic domain memories, flat-panel displays, liquid-crystal displays(LCDs), thin-film magnetic heads, etc.

Although specific reference may be made in this text to embodiments ofthe invention in the context of a lithographic apparatus, embodiments ofthe invention may be used in other apparatus. Embodiments of theinvention may form part of a mask inspection apparatus, a metrologyapparatus, or any apparatus that measures or processes an object such asa wafer (or other substrate) or mask (or other patterning device). Theseapparatus may be generally referred to as lithographic tools. Such alithographic tool may use vacuum conditions or ambient (non-vacuum)conditions.

Although specific reference may have been made above to the use ofembodiments of the invention in the context of optical lithography, itwill be appreciated that the invention, where the context allows, is notlimited to optical lithography and may be used in other applications,for example imprint lithography.

Where the context allows, embodiments of the invention may beimplemented in hardware, firmware, software, or any combination thereof.Embodiments of the invention may also be implemented as instructionsstored on a machine-readable medium, which may be read and executed byone or more processors. A machine-readable medium may include anymechanism for storing or transmitting information in a form readable bya machine (e.g., a computing device). For example, a machine-readablemedium may include read only memory (ROM); random access memory (RAM);magnetic storage media; optical storage media; flash memory devices;electrical, optical, acoustical or other forms of propagated signals(e.g. carrier waves, infrared signals, digital signals, etc.), andothers. Further, firmware, software, routines, instructions may bedescribed herein as performing certain actions. However, it should beappreciated that such descriptions are merely for convenience and thatsuch actions in fact result from computing devices, processors,controllers, or other devices executing the firmware, software,routines, instructions, etc. and in doing that may cause actuators orother devices to interact with the physical world.

While specific embodiments of the invention have been described above,it will be appreciated that the invention may be practiced otherwisethan as described. The descriptions above are intended to beillustrative, not limiting. Thus it will be apparent to one skilled inthe art that modifications may be made to the invention as describedwithout departing from the scope of the claims set out below.

What is claimed is:
 1. An assembly comprising: a cryostat and a coillayer of superconducting coils, wherein the coil layer is configured foruse in or with a magnetic levitation and/or acceleration motor system ofa lithographic apparatus, is flat and defines two opposing layer faces;wherein the cryostat comprises two insulation coverings; wherein thecoil layer is arranged between the two insulation coverings and each ofthe two opposing layer faces is covered by one of the insulationcoverings; wherein each of the insulation covering comprises: an innerplate and an outer plate parallel to the inner plate, the inner platebeing arranged between the outer plate and the coil layer, and aninsulation system arranged between the inner plate and the outer plate;wherein the insulation system is configured to have a vacuum layer;wherein the inner plates are configured to be cryocooled; and whereinthe insulation system of one or both of the insulation coveringscomprises, in the vacuum layer, one of: one or more layers of sphericalbodies are spheres or half-spheres, and at least one of the layers ofspherical bodies providing a layer of point contacts between the layerof spheres and the inner and/or the outer plate, or at least one set oftwo layers of straight cylindrical bodies comprising cylinders and/orhalf-cylinders; wherein the cylindrical bodies of a first of the twolayers are arranged parallel to each other with a spacing betweenadjacent cylindrical bodies and the cylindrical bodies of a second ofthe two layers are arranged parallel to each other with a spacingbetween adjacent cylindrical bodies; and wherein the first layer andsecond layer are stacked directly onto each other with the cylindricalbodies of the first layer crosswise with respect to the cylindricalbodies of the second layer to provide, between the cylindrical bodies ofthe first layer and the cylindrical bodies of the second layer, a layerof point contacts.
 2. The assembly of claim 1, wherein the cylindricalbodies are wires.
 3. The assembly of claim 1, wherein at least one ofthe layers of spherical bodies comprises spheres and a spacer plateprovided with a pattern of through holes for accommodating the spheres,each through hole having a diameter configured to contact at least oneof the spheres such that the spacer plate is supported by the at leastone of the spheres, wherein the spacer plate is arranged parallel to theinner plate and the outer plate.
 4. The assembly of claim 3, wherein athermal expansion coefficient of the spacer plate is larger than thethermal expansion coefficient of the spheres such that when the spacerplate and spheres are cooled down a shrunk connection between the spacerplate and spheres is obtained in the through holes.
 5. The assembly ofclaim 1, comprising a multiple of the layers of spherical bodies,wherein between adjacent ones of the layers of spherical bodies, aseparation plate is arranged that provides, on each side, an additionallayer of point contacts between the separation plate and sphericalbodies.
 6. The assembly of claim 5, wherein the separation plate isconfigured to be cooled at a temperature between a temperature of theinner plate and a temperature of the outer plate.
 7. The assembly ofclaim 1, wherein the cylindrical bodies have a diameter defined as twicea radius from a center of a cylindrical contour to the cylindricalcontour; and wherein the diameter is smaller than 7 mm, or smaller than5 mm.
 8. The assembly of claim 1, wherein the point contacts, in thelayer of point contacts, are arranged with a pitch of 5-20 mm, or apitch of 10-15 mm.
 9. The assembly of claim 1, wherein one of theinsulation coverings has a thickness of at most 10 mm, or at most 7-8mm, the thickness being defined in a direction perpendicular to theinner and outer plate.
 10. The assembly of claim 1, wherein thespherical bodies are made from a material chosen from one or more of thegroup of: zirconia, Kevlar, Kevlar composites, Kevlar fiber composites,glass, glass composites, glass fiber composites, and titanium alloys.11. The assembly of claim 1, wherein the spherical bodies are made froma material having a ratio of the Young modulus with respect to theintegral of the thermal conductivity coefficient over the temperaturerange of 4 K to 80 K, that is at least 1 N/Wm, or at least 1.5 N/Wm. 12.The assembly of claim 1, further comprising a cryocooler systemconfigured for cryocooling the inner plates to a temperature lower than30 K, or lower than 10 K, or in the range of 0 - 4 K.
 13. The assemblyof claim 1, wherein the inner and/or outer plate are made from astainless steel alloy.
 14. The assembly of claim 1, wherein the coillayer is configured as a stator part of the magnetic levitation motorsystem.
 15. The assembly of claim 1, wherein the coil layer isconfigured as a stator part of the acceleration motor system.
 16. Theassembly of claim 1, wherein the coil layer is configured as a moverpart of the magnetic levitation motor system.
 17. The assembly of claim1, wherein the coil layer is configured as a mover part of theacceleration motor system.
 18. The assembly of claim 1, wherein the coillayer of superconducting coils is an array of superconductingelectromagnets, each electromagnet having a north-south axis extendingperpendicular to the coil layer; wherein the array of electromagnets isconfigured such that adjacent electromagnets have opposite polarity; andwherein the array of electromagnets is wired for direct currentoperation.
 19. The assembly of claim 18, wherein the array ofelectromagnets is configured such that adjacent electromagnets haveopposite polarity.
 20. A lithographic apparatus, comprising: a masksupport constructed to support a patterning device, a first positionerconfigured to position the mask support with respect to the firstpositioner, a substrate support constructed to hold a substrate, asecond positioner configured to position the substrate support withrespect to the second positioner, and a projection system configured toproject a pattern imparted to a radiation beam by the patterning deviceonto a target position on the substrate; wherein one or more of thefollowing items: the mask support, the first positioner, the substratesupport, and the second positioner, are provided with the assembly ofclaim 1.